Find high quality 99.95% pure tungsten targets with w1 astm b760 with competitive price here. Please rest assured to buy 99.95% pure tungsten targets with w1 astm b760 with Shaanxi Aone Titanium Metal Materials Co.,Ltd

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99.95% Pure Tungsten Targets With W1 ASTM B760

Tungsten titanium alloy sputtering target can be used to make the diffusion barrier for semiconductor chips, the new solar cell and the ceramic thin film circuit.

Tungsten silicon alloy sputtering target can be used for the ohmic contact layer of the semiconductor chips.

Type	W(wt%)	Ti(wt%)	Si(wt%)	Purity(wt%)	Density(%)	Grain Size& (µm)	Dimension (max.mm)	Ra
WTi10	90±0.5	10±0.5	/	99.9-99.999	=99	?10	?400×40	=1.6
WTi20	80±0.5	20±0.5	/	99.9-99.995	=99	?10	?400×40	=1.6
WSi10	90±0.5	/	10±0.5	99.9-99.999	=99	?10	?400×40	=1.6
WSi20	80±0.5	/	20±0.5	99.9-99.999	=99	?10	?400×40	=1.6