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AlCr Sputtering Target, High Quality, Monolithic, Planar, Cathodic ARC, PVD Coating, Thin Film Deposition, HIP, Powder Metallurgical, Magnetron AlCr Sputtering Targets Manufacturer And Supplier

ALUMINIUM CHROMIUM SPUTTERING TARGET

AlCrN coatings are widely used for tool coating, where outstanding high temperature wear resistance is needed and highest oxidation resistance is beneficial. Those properties can be even more pronounced by selective alloying with other elements. (Al, Cr)₂O₃ coatings have been introduced to the coating market quite recently. These new types of PVD coatings are intended to compete with Al₂O₃ coatings produced by CVD. As the PVD process is limited in temperature, the formation of pure alpha-aluminumoxide is not possible yet. The addition of Cr to the target material results in a growth of mixed (Al, Cr)₂O₃ in the preferred corundum structure. 

Haohai Metal offers the full range of compositions of the AlCr sputtering targets and cathodes, with the highest purity, density and homogeneity. The powder metallurgical production routes allow us to introduce other additional elements for creating tailored coatings. Our  AlCr sputtering targets and cathodes are particularly resistant to breakage and long-lasting, we can be your most reliable partner for AlCr target materials.

Haohai Metal's AlCr sputtering targets include rectangle sputtering targets, circular sputtering targets and cathodic targets.

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Aluminium Chromium Planar (Rectangle, Circular) Sputtering Target

Manufacturing Range

Rectangle	Length (mm)	Width (mm)	Thickness (mm)	Custom Made
	10 - 2000	10 - 600	1.0 - 25
Circular	Diameter (mm)		Thickness (mm)
	10 - 400		1.0 - 25

Specification

Composition [at%]	Al/Cr  30/70, 50/50, 70/30,
Purity	2N7 (99.7%), 3N (99.9%), 3.5N (99.95%)
Density	4.5 g/cm3 for 50/50 at%, 3.98 g/cm3 for 70/30 at%
Grain Sizes	< 80 micron or on request
Fabrication Processes	Powder Metallurgical, Hot Isostatic Pressing(HIP), Machining
Shape	Plate, Disc, Step, Down bolting, Threading, Custom Made
Type	Monolithic, Multi-segmented Target, Bonding
Surface	Ra 1.6 micron or on request

 

Other Specifications

? We make sure the same grain direction in the multi-segmented construction parts.

? Flatness, clean surface, polished, free of crack, oil, dot, etc.

? High ductility, high thermal conductivity, homogeneous microstructure and high purity etc.

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Aluminium Chromium Arc Cathodes

We supply Alunimium Chromium planar arc cathodes as well as Alunimium Chromium planar sputtering targets

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For our Aluminium Chromium Sputtering Targets and Arc Cathodes

Tolerance 

Acc. to drawings or request.

Impurities Content [wt%]

Aluminium Chromium Purity [%]	Elements	70/30 at%, 3N [99.9]
Metallic Impurities [µg/g]	Al	54.465
	Cr	45.1
	Fe	0.125
	Si	0.215
	Cu	0.002
	Mn	0.004
Non-Metallic Impurities [µg/g]	C	0.015
	O	0.071
	S	0.004
	H	0.002
	N	0.002
Guaranteed Density [g/cm3]		3.98
Grain Size [µm]		80
Thermal Conductivity [W/(m.K)]		-
Coefficient of thermal expansion [1/K]		-

Analytical Methods: 

1. Metallic elements were analyzed using GDMS (Precision and bias typical of GDMS measurements are discussed under ASTM F1593). 

2. Gas elements were analyzed using LECO GAS ANALYZER .                                              

? C,S determined by Combustion-lR

? N,H determined by IGF-TC

? O determined by IGF-NDIR    

Application:

? Solar Photovoltaic

? Flat Panel Displats

? Wear Resistant Coating

Haohai Metal (Haohai Titanium), equipped with professional factory, is one of the leading manufacturers and suppliers for various materials and sizes of sputtering targets. Our AlCr sputtering target, with high purity, include bonding or spayed (straight or dogbone) rotatable (rotary, cylindrical) targets, planar (rectangle, disc) targets, which are extensiely used in pvd coating for thin film deposition technology. Welcome to buy and wholesale our low price, high usage rates, high purity and high quality AlCr targets.