Find high quality rf plasma treatment with competitive price here. Please rest assured to buy rf plasma treatment with Kunshan Plaux Electronics Technology Co.,Ltd.

Description of rf plasma treatment

Machine Model: Plasma Processing Equipment

rf plasma treatment Model: PR80L

Equipment weight: about 280KG

Rated power: 3KW

Equipment power supply: AC-380V/three-phase five-wire

rf plasma treatment specification: 920mm(W)×1030mm(D)×1720mm(H)

Vacuum chamber specifications: 450mm (W) × 450mm (D) × 400mm (H) can be customized according to product

Electrode plate specifications: 430mm (W) × 360mm (D), 8 layers, plate spacing: 41mm, can be any combination

Single layer treatment of the largest area: 390mm (W) × 345mm (D)

Bracket mode: custom aluminum bracket structure

Capacity: According to product specifications

Processing time: different process, different processing time

Plasma generator power: RF 13.56MH z, 0-500W adjustable

Vacuum Pump System: Mechanical Vacuum Pump

Vacuum Measurement System: Aifa High Precision Vacuum Gauge

Working vacuum degree: 20-60Pa

Vacuum pump limit pressure: 4.0×10-1Pa

Vacuum time: =60S

Breaking vacuum time: 20-60S

Gas supply method: solenoid valve type

Flowmeter adjustment range: 0-300Sccm (ml/min)

Input air pressure monitoring system: 2 air pressure decompression tables, 2 gas mass flow meters

Operation method: manually take and place the workpiece, start automatic control with a key

Uses: Different combinations for different process manufacturing, can be used to connect devices, metal-based workpieces, ceramics, glass and other workpiece surface cleaning, activation and so on.

 

Company of rf plasma treatment

 

Package of rf plasma treatment